WASHINGTON, June 5 (Reuters) - A ‌showdown over U.S. President Donald Trump’s pick of loyalist Bill Pulte as acting U.S. spy chief sharpened on Friday, as concerns over his fitness for the post held ...
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Abstract: Chemical Mechanical Polishing (CMP) is essential for global planarization in advanced semiconductor manufacturing, where its performance directly impacts device yield and reliability. Yet, ...
Abstract: Recently introduced distributed zeroth-order optimization (ZOO) algorithms have shown their utility in distributed reinforcement learning (RL). Unfortunately, in the gradient estimation ...
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